| 摘要 |
PURPOSE: A substrate processing apparatus is provided to change a process performed on a substrate for each substrate processing row, thereby suitably changing the process performed on the substrate for each substrate. CONSTITUTION: A supply part(34) comprises a plurality of nozzles(35), a grip part(36), and a nozzle transfer device(37). The nozzle transfer device transfers the nozzle between a standby position and a processing position of the upper side of a substrate(W). The nozzle transfer device comprises a first guide rail(37a) and a second guide rail(37b). One end of a processing liquid pipe(38) is connected to the nozzle. A heat treatment unit comprises a plate for mounting the substrate. |
