BATCH TYPE HEAT TREATMENT APPARATUS FOR LARGE SUBSTRATE

摘要

PURPOSE: A batch type thermal processing device for a large substrate is provided to remove a back scratch phenomenon of a substrate with regard to a holder by controlling the location arrangement and the number of substrate support pins installed on the holder. CONSTITUTION: A chamber(100) provides a thermal process space of a substrate. A heater(110) is installed in the chamber. A boat(120) is installed in the chamber. A holder is detachably installed in the boat. A plurality of substrate support stands(131) are formed on the holder and support the substrate.