发明名称 SEMICONDUCTOR PHOTO DEVICE STRUCTURE HAVING ELECTRON CONSUMPTION LAYER AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: A semiconductor photo device structure having an electron consumption layer and a manufacturing method thereof are provided to improve quantum efficiency by inserting an electron consumption layer and reducing electronics overflow. CONSTITUTION: A template layer(220) is formed on a substrate(210). A light emission diode layer(230) is formed on the template layer. The light emission diode layer comprises an N type GaN layer(231), a multiple quantum well(232), an Mid-P layer(233), and an electronics depletion layer(234). An ECL restricts the electronics gain and increase the recombination of electron-hole. A P-type nitride semiconductor layer(235) is formed on the ECL.
申请公布号 KR20120018581(A) 申请公布日期 2012.03.05
申请号 KR20100081512 申请日期 2010.08.23
申请人 KOREA POLYTECHNIC UNIVERSITY INDUSTRY ACADEMIC COOPERATION FOUNDATION 发明人 NAM, OK HYUN;KIM, JIN WAN;MIN, DAE HONG;LYU, YONG WOO;LEE, GA YEON;JUNG, CHIL SUNG
分类号 H01L33/14;H01L33/04 主分类号 H01L33/14
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