| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography apparatus in which a collector of a radiation source and components of the lithography apparatus located remotely along a path of a radiation beam can be arranged or rearranged. <P>SOLUTION: The lithography apparatus comprises a source-collector module including a collector which collects radiation from a radiation source, an illuminator which provides a radiation beam by adjusting the collected radiation, and a detector arrangement. The detector arrangement comprises a reflector arrangement 52 arranged in fixed positional relationship for the illuminator and reflects radiation from the source-collector module, and a sensor arrangement 54 arranged in fixed positional relationship for the reflector arrangement 52 and measures characteristics of at least one radiation reflected on a reflector. The detector arrangement determines the place of far-field position of radiation as a function of the characteristics of at least one radiation measured by the sensor arrangement 54. <P>COPYRIGHT: (C)2012,JPO&INPIT |
