| 发明名称 |
Etching method for use in deep-ultraviolet lithography |
| 摘要 |
In a lithography process using an ultraviolet process, the applied ultraviolet resist can be removed by intentionally condensing the ultraviolet resist before removing the ultraviolet resist. |
| 申请公布号 |
US8124321(B2) |
申请公布日期 |
2012.02.28 |
| 申请号 |
US20080185197 |
申请日期 |
2008.08.04 |
| 申请人 |
ROTH RONALD CHARLES;PARK GEORGINA MARIE;ANTHRAPER ROSEMARY URMESE;TEXAS INSTRUMENTS INCORPORATED |
发明人 |
ROTH RONALD CHARLES;PARK GEORGINA MARIE;ANTHRAPER ROSEMARY URMESE |
| 分类号 |
G03F7/28 |
主分类号 |
G03F7/28 |
| 代理机构 |
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代理人 |
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| 主权项 |
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