| 发明名称 |
Microporous tectosilicate and method for the production thereof |
| 摘要 |
The present invention relates to a tectosilicate having an X-ray diffraction pattern in which at least the following reflections occur: Intensity (%) Diffraction angle 2&thetas;/° [Cu K(alpha 1)] 100  9.8-10.2 24-34 11.0-11.4  9-19 15.5-15.9 12-22 19.4-19.6 19-29 19.6-19.8 100% relating to the intensity of the maximum peak in the X-ray diffraction pattern. |
| 申请公布号 |
US8124560(B2) |
申请公布日期 |
2012.02.28 |
| 申请号 |
US20100899572 |
申请日期 |
2010.10.07 |
| 申请人 |
MUELLER ULRICH;LIPPERT GERALD;BROWN JAMES REUBEN;GIES HERMANN;MARLER BERND;STROETER NADINE;WANG YINGXIA;BASF AKTIENGESELLSCHAFT;RUBITEC GMBH |
发明人 |
MUELLER ULRICH;LIPPERT GERALD;BROWN JAMES REUBEN;GIES HERMANN;MARLER BERND;STROETER NADINE;WANG YINGXIA |
| 分类号 |
B01D53/02;B01J29/04;C01B33/20;C01B37/00;C01B39/02;C01B39/04;C04B35/16 |
主分类号 |
B01D53/02 |
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