发明名称 |
FLUID HANDLING STRUCTURE, MODULE FOR AN IMMERSION LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. |
摘要 |
A fluid handling structure successively having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a fluid supply opening radially outward of the meniscus pinning feature to supply a fluid soluble in the immersion fluid which on dissolution into the immersion fluid lowers the surface tension of the immersion fluid. |
申请公布号 |
NL2007182(A) |
申请公布日期 |
2012.02.27 |
申请号 |
NL20112007182 |
申请日期 |
2011.07.26 |
申请人 |
ASML NETHERLANDS B.V., |
发明人 |
WILLEMS, PAUL;KATE, NICOLAAS;KOELINK, STEPHAN;KRAMER, PIETER;KUIJPER, ANTHONIE;ZDRAVKOV, ALEXANDER;CORTIE, ROGIER |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|