| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and device for inspecting a polycrystal silicon wafer, which are capable of performing appropriate inspection without over-detection of foreign matters on a surface of the polycrystal silicon wafer by reducing contrast of the polycrystal silicon wafer. <P>SOLUTION: In the method for inspecting the polycrystal silicon wafer, light from a light source is irregularly reflected by an inner surface of a cover and is indirectly radiated to a surface of the wafer, and the irradiated surface of the wafer is imaged through an imaging part provided in the cover, by imaging means provided on the outside of the cover, to acquire an image, and defects on the surface of the wafer are detected by this image. <P>COPYRIGHT: (C)2012,JPO&INPIT |
