| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide developing equipment and a developing method, in which unevenness of a developer coated on a substrate is reduced in the vertical developing equipment used for manufacturing a plasma display panel. <P>SOLUTION: Developing equipment comprises: a developing room 17 for spraying a developer; a washing room 19 for washing a substrate 22; a developer supply system for supplying the developer to the developing room; and a conveyor belt 21 for transporting the substrate 22 having a predetermined pattern preliminarily coated with a photosensitive material and subjected to exposure irradiation treatment, from the developing room 17 to the washing room 19 next to the developing room. In the equipment, entire front and back surfaces of the substrate are washed by water to wash off from the substrate 22 the developer attached thereto and resin components peeled therefrom during the developing, and the like, while transported from the developing room 17 to the washing room 19, and the developer on the substrate 22 is removed by using n pieces of air-cuts 18a to 18n having a nozzle width of W1>W2...>Wn, respectively, and arranged in a transporting direction. <P>COPYRIGHT: (C)2012,JPO&INPIT |
