发明名称 Micro-Electro-Mechanical Device And Manufacturing Method For The Same
摘要 It is an object of the present invention to provide a micro-electro-mechanical-device having a microstructure and a semiconductor element over one surface. In particular, it is an object of the present invention to provide a method for simplifying the process of forming the microstructure and the semiconductor element over one surface. A space in which the microstructure is moved, that is, a movable space for the microstructure is formed by procecssing an insulating layer which is formed in a process of forming the semiconductor element. The movable space can be formed by forming the insulating layer having a plurality of openings and making the openings face each other to be overlapped each other.
申请公布号 US2012043594(A1) 申请公布日期 2012.02.23
申请号 US201113287150 申请日期 2011.11.02
申请人 TATEISHI FUMINORI;IZUMI KONAMI;YAMAGUCHI MAYUMI;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 TATEISHI FUMINORI;IZUMI KONAMI;YAMAGUCHI MAYUMI
分类号 H01L29/772;H01L29/02;H01L29/84 主分类号 H01L29/772
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