发明名称 APPARATUS AND METHOD FOR REVIEW TESTING THIN FILM TRANSISTOR SUBSTRATE
摘要 PURPOSE: A review inspection apparatus and method for a thin film transistor substrate are provided to detect faults on the upper and lower surface of a thin film transistor substrate at the same time using an upper optical system located above the substrate. CONSTITUTION: A review inspection apparatus for a thin film transistor substrate comprises a stage(140), an upper optical system(110), and a lower optical system(130). In the stage, a thin film transistor substrate(150) is settled. The upper optical system is located above the thin film transistor substrate. The lower optical system is located underneath the thin film transistor substrate. Light coming out from one of the optical systems is reflected off the thin film transistor inside substrate for review inspection of either the upper surface or lower surface of the thin film transistor substrate and then passes through the thin film transistor substrate for review inspection of the other.
申请公布号 KR20120014439(A) 申请公布日期 2012.02.17
申请号 KR20100076509 申请日期 2010.08.09
申请人 LG DISPLAY CO., LTD. 发明人 YANG, JEONG BOK;LEE, GUN HEE;KIM, KI TAE
分类号 G01N21/88;G01B11/30 主分类号 G01N21/88
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