| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a management system for a specimen processing device, the specimen processing device and a management apparatus in which each of the specimen processing devices can be accurately and easily adjusted regardless of an individual difference for each specimen processing device. <P>SOLUTION: When any abnormality occurs in a specimen analysis device 2, the specimen analysis device 2 requests an approval of self-adjustment to a management server 5. The management server 5 determines whether to permit execution of the self-adjustment and, when the permission of the execution of the self-adjustment is determined, notifies the specimen analysis device 2 of the approval of the self-adjustment. Upon notifying the approval of the self-adjustment, the specimen analysis device 2 executes the self-adjustment. <P>COPYRIGHT: (C)2012,JPO&INPIT |
