| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce an external force applied to a recording element substrate due to a stress generated by a sealing material, and to suppress degradation in recording quality due to wiping. <P>SOLUTION: A liquid ejection apparatus 400 includes a liquid ejection head H1000 and a wiping member 10 configured to relatively move in a direction from a second recess H1002 toward a first recess H1001 with respect to an ejection port surface H1109 of a recording element substrate H1101 to wipe the ejection port surface H1109. The first recess H1001 and the second recess H1002 are provided with sealing materials in which the first recess is provided with the sealing material to a level higher than the level of the sealing material in the second recess, in a direction of ejecting liquid. <P>COPYRIGHT: (C)2012,JPO&INPIT |
