发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SUCH A DEVICE |
摘要 |
A semiconductor device and method for producing such a device is disclosed. One embodiment provides a semiconductor functional wafer having a first and second main surface. Component production processes are performed for producing a component functional region at the first main surface, wherein the component production processes produce an end state that is stable up to at least a first temperature. A carrier substrate is fitted to the first main surface. Access openings are produced to the first main surface. At least one further component production process is performed for producing patterned component functional regions at the first main surface of the functional wafer in the access openings. The end state produced in this process is stable up to a second temperature, which is less than the first temperature. |
申请公布号 |
US2012032295(A1) |
申请公布日期 |
2012.02.09 |
申请号 |
US201113269918 |
申请日期 |
2011.10.10 |
申请人 |
KROENER FRIEDRICH;SANTOS RODRIGUEZ FRANCISCO JAVIER;VON KOBLINSKI CARSTEN;INFINEON TECHNOLOGIES AG |
发明人 |
KROENER FRIEDRICH;SANTOS RODRIGUEZ FRANCISCO JAVIER;VON KOBLINSKI CARSTEN |
分类号 |
H01L27/12 |
主分类号 |
H01L27/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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