发明名称 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM STORING SUBSTRATE PROCESSING PROGRAM
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of improving throughput of substrate processing. <P>SOLUTION: In a substrate processing apparatus, substrate processing method and substrate processing program used in the substrate processing apparatus, the substrate processing apparatus includes: a substrate delivery table 11; a substrate transfer mechanism 36 for carrying in and carrying out substrates between substrate processing chambers 15 and 16 for processing the substrates one by one; and N number (N is an integer equal to or larger than 3) of substrate holding devices for holding the substrates one by one. A plurality of (2 to N-1 number of) the substrates are concurrently held by 2 to N-1 number of substrate holding devices among the N number of substrate holding devices and the substrates are carried in and carried out one by one to/from the substrate processing chambers 15 and 16. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012023341(A) 申请公布日期 2012.02.02
申请号 JP20110129374 申请日期 2011.06.09
申请人 TOKYO ELECTRON LTD 发明人 MURATA AKIRA;UEDA KAZUNARI;KURODA OSAMU;KIMOTO KOJI;YOSHIDA MASAHIRO
分类号 H01L21/677 主分类号 H01L21/677
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