发明名称 Systems and Devices Including Multi-Gate Transistors and Methods of Using, Making, and Operating the Same
摘要 Disclosed are methods of forming transistors. In one embodiment, the transistors are formed by forming a plurality of elliptical bases in a substrate and forming fins form the elliptical bases. The transistors are formed within the fin such that they may be used as access devices in a memory array.
申请公布号 US2012018789(A1) 申请公布日期 2012.01.26
申请号 US201113183337 申请日期 2011.07.14
申请人 JUENGLING WERNER;MICRON TECHNOLOGY, INC. 发明人 JUENGLING WERNER
分类号 H01L27/108;H01L27/088;H01L29/78 主分类号 H01L27/108
代理机构 代理人
主权项
地址