发明名称 PROCESS FOR PREPARING SOLUTIONS OF RADIATION-SENSITIVE, FREE-RADICALLY POLYMERIZABLE ORGANIC COMPOUNDS
摘要 A description is given of a process for preparing solutions of radiation-sensitive, free-radically polymerizable organic compounds, where a first starting compound, which has an acid halide group, and a second starting compound, which has an alcoholic hydroxyl group, are esterified with one another in a solvent or in a solvent mixture. The solvent comprises one or more ketones having a boiling point of below 150° C. under atmospheric pressure (1 bar), or the solvent mixture is composed to an extent of at least 50% by weight of said ketones. One of the two starting compounds has at least one radiation-sensitive group and the other of the two starting compounds has at least one ethylenically unsaturated, free-radically polymerizable group. A description is also given of corresponding solutions of radiation-sensitive, free-radically polymerizable organic compounds and of their use for preparing radiation-crosslinkable, free-radically copolymerized copolymers, more particularly for hotmelt pressure-sensitive adhesives or aqueous polymer dispersions.
申请公布号 US2012016079(A1) 申请公布日期 2012.01.19
申请号 US201013258899 申请日期 2010.03.30
申请人 WEISKOPF VERENA;WINDLIN FRANZ NIKLAUS;WINSEL HARALD;RUCKPAUL MARKUS;WULFF DIRK;DUESTERWALD UWE;LICHT ULRIKE;BASF SE 发明人 WEISKOPF VERENA;WINDLIN FRANZ NIKLAUS;WINSEL HARALD;RUCKPAUL MARKUS;WULFF DIRK;DUESTERWALD UWE;LICHT ULRIKE
分类号 C08F220/10;C08F2/06;C08K5/07 主分类号 C08F220/10
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