| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mold for nanoimprint capable of reducing a variation of a fine pattern shape due to a height distribution of a surface of a workpiece. <P>SOLUTION: The mold 1 for nanoimprint includes a mold base part 3, a mold body 5 having a rear surface 5B and a pattern surface 5S opposite to the rear surface 5B, and an elastic part 7 fixed between the surface 3S of the mold base part 3 and the rear surface 5B of the mold body 5. A pattern 5P for nanoimprint is formed on the pattern surface 5S of the mold body 5, and the bulk modulus of the elastic part 7 is smaller than the bulk modulus of the mold body 5. <P>COPYRIGHT: (C)2012,JPO&INPIT |
