PROCESS OF PREPARING AN ANISOTROPIC MULTILAYER USING PARTICLE BEAM ALIGNMENT

摘要

The invention relates to a process of preparing a multilayer comprising two or more anisotropic layers with different optical axes by using a particle beam etching technique, to a multilayer obtained by said process, to the use of such a multilayer as optical compensator or retarder in optical and electrooptical devices, and to devices comprising such a multilayer.