| 摘要 |
PURPOSE: Sulfonate, a derivative thereof, a photoacid generator including thereof, and a resist composition are provided to offer the high-sensitivity, high definition, excellent adhesion property, and the strong acidity to the resist composition. CONSTITUTION: Sulfonate is marked with chemical formula 1. In the chemical formula 1, R1 and R2 are selected from hydrogen, a C1-20 linear alkyl group, a C3-20 branched or cyclic alkyl group, or a C6-15 aryl group, separately. The alkyl group or the aryl group is capable of being substituted with a linear, a branched, or a cyclic alkyl group. M^+ is selected from a lithium ion, a sodium ion, a potassium ion, an ammonium ion, a tetraalkylammonium ion, an iodonium ion, or a tetrahydrothiophene ion substituted with the alkyl group, the aryl group, or an alkoxy group.
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