PLASMA PROCESSING APPARATUS

摘要

PURPOSE: A plasma processing apparatus is provided to discharge residual gas through the upper part of a chamber, thereby improving the uniformity of plasma generated in a plasma generation electrode. CONSTITUTION: A plasma processing apparatus(1000) comprises a chamber(1300) and a plasma generation electrode including a substrate support stand(1100) and a plurality of linear members(111). The substrate support stand is arranged in the lower part of the inside of the chamber in order to support a substrate(S). One or more parts among the plasma generation electrode and a susceptor are transferred following the movement of the substrate. The plasma generation electrode is arranged in the upper part of the substrate support stand by facing the substrate support stand. The plasma generation electrode comprises linear electrode members which are arranged side by side. The linear electrode members have a pipe shape which has a gas injection hole(112) in the lower part of the linear electrode members. The chamber accepts the substrate support stand and plasma generation electrode. An exhaust pipe(1400) is arranged in the central part of the chamber.