发明名称 TRANSPARENT CONDUCTIVE FILM AND MANUFACTURING METHOD THEREFOR
摘要 Disclosed is a method for manufacturing a long transparent conductive film comprising a crystalline iridium composite oxide film formed on a transparent film substrate. Said method includes: an amorphous laminate formation step in which an amorphous iridium complex oxide film that contains iridium and a tetravalent metal is formed on a long transparent film substrate by a sputtering method; and a crystallization step in which the long transparent film substrate on which the aforementioned amorphous film is formed is continuously fed into a furnace and the amorphous film is crystallized. The temperature of the furnace in the crystallization step is preferably 170-220°C, and the length of the film preferably changes by at most +2.5% in the crystallization step.
申请公布号 WO2012005300(A1) 申请公布日期 2012.01.12
申请号 WO2011JP65493 申请日期 2011.07.06
申请人 NITTO DENKO CORPORATION;YAMAZAKI, YUKA;NASHIKI, TOMOTAKE;SUGAWARA, HIDEO;MACHINAGA, HIRONOBU;SASAKI, ERI 发明人 YAMAZAKI, YUKA;NASHIKI, TOMOTAKE;SUGAWARA, HIDEO;MACHINAGA, HIRONOBU;SASAKI, ERI
分类号 C23C14/08;B32B9/00;C23C14/58;H01B13/00 主分类号 C23C14/08
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