TRANSPARENT CONDUCTIVE FILM AND MANUFACTURING METHOD THEREFOR
摘要
Disclosed is a method for manufacturing a long transparent conductive film comprising a crystalline iridium composite oxide film formed on a transparent film substrate. Said method includes: an amorphous laminate formation step in which an amorphous iridium complex oxide film that contains iridium and a tetravalent metal is formed on a long transparent film substrate by a sputtering method; and a crystallization step in which the long transparent film substrate on which the aforementioned amorphous film is formed is continuously fed into a furnace and the amorphous film is crystallized. The temperature of the furnace in the crystallization step is preferably 170-220°C, and the length of the film preferably changes by at most +2.5% in the crystallization step.
申请公布号
WO2012005300(A1)
申请公布日期
2012.01.12
申请号
WO2011JP65493
申请日期
2011.07.06
申请人
NITTO DENKO CORPORATION;YAMAZAKI, YUKA;NASHIKI, TOMOTAKE;SUGAWARA, HIDEO;MACHINAGA, HIRONOBU;SASAKI, ERI
发明人
YAMAZAKI, YUKA;NASHIKI, TOMOTAKE;SUGAWARA, HIDEO;MACHINAGA, HIRONOBU;SASAKI, ERI