METHOD FOR MANUFACTURING A TRANSPARENT CONDUCTIVE FILM
摘要
<p>Disclosed is a method for manufacturing a long transparent conductive film comprising a crystalline iridium composite oxide film formed on a transparent film substrate. Said method includes: an amorphous laminate formation step in which an amorphous iridium complex oxide film that contains iridium and a tetravalent metal is formed on a long transparent film substrate by a sputtering method; and a crystallization step in which the long transparent film substrate on which the aforementioned amorphous film is formed is continuously fed into a furnace and the amorphous film is crystallized. The mass of the tetravalent metal in the aforementioned iridium complex oxide preferably constitutes more than 0% and no more than 15% of the combined mass of the iridium and the tetravalent metal.</p>