发明名称 METHOD FOR MANUFACTURING A TRANSPARENT CONDUCTIVE FILM
摘要 <p>Disclosed is a method for manufacturing a long transparent conductive film comprising a crystalline iridium composite oxide film formed on a transparent film substrate. Said method includes: an amorphous laminate formation step in which an amorphous iridium complex oxide film that contains iridium and a tetravalent metal is formed on a long transparent film substrate by a sputtering method; and a crystallization step in which the long transparent film substrate on which the aforementioned amorphous film is formed is continuously fed into a furnace and the amorphous film is crystallized. The mass of the tetravalent metal in the aforementioned iridium complex oxide preferably constitutes more than 0% and no more than 15% of the combined mass of the iridium and the tetravalent metal.</p>
申请公布号 WO2012005290(A1) 申请公布日期 2012.01.12
申请号 WO2011JP65478 申请日期 2011.07.06
申请人 NITTO DENKO CORPORATION;YAMAZAKI,YUKA;NASHIKI,TOMOTAKE;SUGAWARA,HIDEO 发明人 YAMAZAKI,YUKA;NASHIKI,TOMOTAKE;SUGAWARA,HIDEO
分类号 C23C14/08;B32B9/00;C23C14/58;H01B13/00 主分类号 C23C14/08
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