发明名称 |
MOVABLE GROUND RING FOR A PLASMA PROCESSING CHAMBER |
摘要 |
A movable ground ring of a movable substrate support assembly is described. The movable ground ring is configured to fit around and provide an RF return path to a fixed ground ring of the movable substrate support assembly in an adjustable gap capacitively-coupled plasma processing chamber wherein a semiconductor substrate supported in the substrate support assembly undergoes plasma processing. |
申请公布号 |
US2012003836(A1) |
申请公布日期 |
2012.01.05 |
申请号 |
US20100828120 |
申请日期 |
2010.06.30 |
申请人 |
KELLOGG MICHAEL C.;MARAKHTANOV ALEXEI;DHINDSA RAJINDER;LAM RESEARCH CORPORATION |
发明人 |
KELLOGG MICHAEL C.;MARAKHTANOV ALEXEI;DHINDSA RAJINDER |
分类号 |
H01L21/3065;C23C14/34;C23C16/00;C23F1/08 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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