发明名称 |
GRAPHENE SUBSTITUTED WITH BORON AND NITROGEN AND METHOD OF FABRICATIONG THE SAME AND TRANSISTOR HAVING THE SAME |
摘要 |
<p>PURPOSE: Graphene, a method for manufacturing the same, and a transistor including the same are provided to substitute boron and nitrogen in the graphene at the same ratio using borazine or ammonia borane as a precursor. CONSTITUTION: Band gap is formed in graphene by substituting a part of carbon atoms with boron and nitrogen. 1-20% of the carbon atoms in the graphene are substituted. The density difference of the boron and the nitrogen is 1013cm^-2 or less. When the graphene is formed through a chemical vapor deposition method, borazine or ammonia borane is used as the precursor of the boron and the nitrogen.</p> |
申请公布号 |
KR20110138611(A) |
申请公布日期 |
2011.12.28 |
申请号 |
KR20100058604 |
申请日期 |
2010.06.21 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, SUNG HOON;SEO, SUN AE;WOO, YUN SUNG;CHUNG, HYUN JONG;HEO, JIN SEONG |
分类号 |
C01B31/02;C23C16/30;H01L29/772 |
主分类号 |
C01B31/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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