发明名称 |
SUPPORT STRUCTURE AND PROCESSING APPARATUS |
摘要 |
PURPOSE: A support structure and a processing device are provided to increase uniformity in a plane whose thickness is the same as the thickness of a film of a processed object placed on the top or the bottom of the support structure. CONSTITUTION: A wafer boat(46) is made of a top plate part(48), a bottom part(50), and a support pillar(60). An opening in the lower part of a processing container(44) is sealed by a cover part(62) made of quartz. A seal member(64) is placed between the lower part of the processing container and a part around the cover part. A table(68) is supported onto the top of a rotation axis(70) which penetrates the cover part. The rotation axis is attached to the leading end of an arm(74A) which is supported in an elevation machine(74). |
申请公布号 |
KR20110138189(A) |
申请公布日期 |
2011.12.26 |
申请号 |
KR20110058945 |
申请日期 |
2011.06.17 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
ASARI SHINJI;OKADA MITSUHIRO |
分类号 |
H01L21/205;H01L21/30;H01L21/683 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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