| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a novel radiation-sensitive composition for a color filter, which is free of undissolved substances remained or a scum on a pattern edge during development, and gives a pixel and a black matrix without chipping in a pattern edge or undercut even when the luminous energy of exposure is low. <P>SOLUTION: A radiation-sensitive composition for a color filter comprises: (A) a polymer, which is obtained by allowing a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, (a2) an unsaturated compound having at least one hydroxyl group in one molecule and (a3) another unsaturated compound to react with a specified isocyanate compound and which has a structure expressed by formula (2); (B) a colorant; (C) a polyfunctional monomer; and (D) a photo-radical generator. <P>COPYRIGHT: (C)2012,JPO&INPIT |
