发明名称 Semiconductor Device and Method of Forming Dam Material Around Periphery of Die to Reduce Warpage
摘要 A semiconductor device has a carrier. A first semiconductor die is mounted to the carrier with an active surface of the first semiconductor die oriented toward the carrier. A dam structure is formed on the carrier and around the first semiconductor die by depositing dam material on the carrier with screen printing, electrolytic plating, electroless plating, or spray coating. An encapsulant is deposited over the carrier and around the first semiconductor die. The encapsulant has a coefficient of thermal expansion (CTE) that corresponds to a CTE of the dam material. The CTE of the dam material is equal to or less than the CTE of the encapsulant. The carrier is removed to expose the active surface of the first semiconductor die with the dam structure stiffening a periphery of the first semiconductor die. The semiconductor device is singulated through the dam structure.
申请公布号 US2011309488(A1) 申请公布日期 2011.12.22
申请号 US201113223478 申请日期 2011.09.01
申请人 PAGAILA REZA A.;STATS CHIPPAC, LTD. 发明人 PAGAILA REZA A.
分类号 H01L21/56;H01L23/34 主分类号 H01L21/56
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