发明名称 SINGLE-ELECTRON TRANSISTOR HAVING CHARGE STORAGE LAYER AND FABRICATION METHOD OF THE SAME
摘要 <p>PURPOSE: A single-electron transistor which includes a charge storage layer and a manufacturing method thereof are provided to inject an electron or hole in the charge storage layer equipped in an insulating layer of a control gate, thereby controlling an oscillation starting point of a device. CONSTITUTION: A source region(22) and drain region(24) are separately arranged with a fixed interval while placing a channel region between the source region and drain region. A control gate(40) is arranged on the channel region while placing a first gate insulating film(30) between the control gate and channel region. A charge storage layer(34) is included in the first gate insulating film. Two side gates(60) are arranged while placing a second gate insulating film(52) between the side gates. An insulating film sidewall(70) is arranged in both sides of the two side gates.</p>
申请公布号 KR20110136534(A) 申请公布日期 2011.12.21
申请号 KR20100056620 申请日期 2010.06.15
申请人 SNU R&DB FOUNDATION 发明人 PARK, BYUNG GOOK;LEE, JUNG HAN
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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