发明名称 |
SINGLE-ELECTRON TRANSISTOR HAVING CHARGE STORAGE LAYER AND FABRICATION METHOD OF THE SAME |
摘要 |
<p>PURPOSE: A single-electron transistor which includes a charge storage layer and a manufacturing method thereof are provided to inject an electron or hole in the charge storage layer equipped in an insulating layer of a control gate, thereby controlling an oscillation starting point of a device. CONSTITUTION: A source region(22) and drain region(24) are separately arranged with a fixed interval while placing a channel region between the source region and drain region. A control gate(40) is arranged on the channel region while placing a first gate insulating film(30) between the control gate and channel region. A charge storage layer(34) is included in the first gate insulating film. Two side gates(60) are arranged while placing a second gate insulating film(52) between the side gates. An insulating film sidewall(70) is arranged in both sides of the two side gates.</p> |
申请公布号 |
KR20110136534(A) |
申请公布日期 |
2011.12.21 |
申请号 |
KR20100056620 |
申请日期 |
2010.06.15 |
申请人 |
SNU R&DB FOUNDATION |
发明人 |
PARK, BYUNG GOOK;LEE, JUNG HAN |
分类号 |
H01L27/115;H01L21/8247 |
主分类号 |
H01L27/115 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|