发明名称 |
Apparatus and method for heating substrate and coating and developing system |
摘要 |
A substrate heating apparatus includes a top plate arranged above a hot plate so that a vertical space is formed between the hot plate and the top plate. The top plate has an evacuated internal chamber serving as a vacuum insulating layer that suppresses heat transfer from a first surface of the top plate facing the hot plate to a second surface of the top plate opposite to the first surface. When heating the substrate, a gas flow flowing through the space between the hot plate and the top plate is generated. |
申请公布号 |
US8080765(B2) |
申请公布日期 |
2011.12.20 |
申请号 |
US20100880784 |
申请日期 |
2010.09.13 |
申请人 |
HAYASHI SHINICHI;FUKUOKA TETSUO;ODA TETSUYA;INADOMI HIROAKI;TOKYO ELECTRON LIMITED |
发明人 |
HAYASHI SHINICHI;FUKUOKA TETSUO;ODA TETSUYA;INADOMI HIROAKI |
分类号 |
F27B5/14;C23C16/00 |
主分类号 |
F27B5/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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