发明名称 |
Illumination optical apparatus, exposure apparatus, and device manufacturing method |
摘要 |
An illumination optical apparatus of the present invention includes an illumination optical system having a plurality of reflection mirrors arranged to guide illumination light flux to an irradiated plane. A first partial field stop is arranged in an optical path of the illumination optical system to form a first profile line of an illumination region that is to be formed on the irradiated plane. A second partial field stop is arranged between the illumination optical system and the irradiated plane to form a second profile line of the illumination region. The illumination optical system includes a relay optical system for substantially optically conjugating the position of the first partial field stop and the position of the second partial field stop. |
申请公布号 |
US8081296(B2) |
申请公布日期 |
2011.12.20 |
申请号 |
US20080170933 |
申请日期 |
2008.07.10 |
申请人 |
KOMATSUDA HIDEKI;NIKON CORPORATION |
发明人 |
KOMATSUDA HIDEKI |
分类号 |
G03B27/72;G03B27/54;G03B27/58 |
主分类号 |
G03B27/72 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|