| 摘要 |
PURPOSE: An etchant composition for a metal alloy monolayer is provided to prevent the etching failure problems and the curling of the upper side of aluminum when the composition is applied to the metal alloy monolayer. CONSTITUTION: An etchant composition is for etching an aluminum alloy monolayer in an Al-Ni or Al-Ni-X structure formed with more than 90% of aluminum, less than 10% of nickel, and less than 1% of other metal. The composition contains 60-70wt% of phosphoric acid, 5-15wt% of nitric acid, 1-5wt% of water-soluble organic acid, 0.1-5wt% of etching activator, 0.1-5wt% of etching modifier, and the balance of water. X in the Al-Ni-X structure is a metal selected from Mg, Mn, Pb, Cd, Zn, In, Bi, Ca, Te, Sr, Cr, Co, Mo, Nb, Ta, W, Be, Nd, Sn, Fe, Si, Ti, V, Pt, or C.
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