A REAL TIME PRECURSOR VAPOR PRESSURE MEASURING SYSTEM FOR SEMICONDUCTOR MANUFACTURING PROCESS AND METHOD USING THE SAME

摘要

PURPOSE: A real time precursor vapor pressure measuring system for a semiconductor manufacturing process and a method using the same are provided to drastically reduce pressure change possibility, thereby accurately measuring vapor pressure in real time. CONSTITUTION: A sample container(100) receives a precursor sample. A chemical vapor deposition chamber(200) is connected to the sample container by an oiling pipe(10). A vapor pressure measuring device(300) measures the pressure of the oiling pipe. The vapor pressure measuring device includes a branch oiling path(20), a pressure measuring unit(400), a first valve(610), and a second valve(620). The sample container and the vapor pressure measuring device are made of heat insulating partition walls(700).