发明名称 |
METHOD FOR MANUFACTURING INSULATED CONDUCTIVE PATTERN AND LAMINATE |
摘要 |
The present invention provides: a method for manufacturing an insulated conductive pattern, wherein a conductive film and an insulation layer pattern are formed on a substrate, and the insulation layer pattern is reformed to cover a conductive pattern after formation of the conductive pattern by etching the conductive film using the insulation layer pattern as a mask; and a laminate manufactured thereby. According to the present invention, the number of processes is sharply reduced in comparison with the existing processes, and economic efficiency can be greatly improved. |
申请公布号 |
EP2395542(A2) |
申请公布日期 |
2011.12.14 |
申请号 |
EP20100738773 |
申请日期 |
2010.02.08 |
申请人 |
LG CHEM, LTD. |
发明人 |
HWANG, JI-YOUNG;MIN, SUNG-JOON;HWANG, IN-SEOK;LEE, DONG-WOOK;CHUN, SANG-KI |
分类号 |
H05K3/06;H05K3/28 |
主分类号 |
H05K3/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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