发明名称 |
Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties |
摘要 |
A coating process comprises forming a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective coating material contained in a single solution. When depositing this solution on a substrate and removing the solvent, the two materials self-segregate into two layers. This produces a coated substrate having a uniaxial bilayer coating oriented in a direction orthogonal to the substrate with a top photoresistive coating layer and a bottom antireflective coating layer. Pattern-wise exposing the coated substrate to imaging radiation and contacting the coated substrate with a developer, produces the patterned material layer. Any optional top coat material and a portion of the photoresist layer can be simultaneously removed from the coated substrate to form a patterned photoresist layer on the substrate.
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申请公布号 |
US2011300483(A1) |
申请公布日期 |
2011.12.08 |
申请号 |
US201113190252 |
申请日期 |
2011.07.25 |
申请人 |
CHENG JOY;GOLDFARB DARIO L.;MEDEIROS DAVID R.;SANDERS DANIEL P.;PFEIFFER DIRK;VYKLICKY LIBOR;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CHENG JOY;GOLDFARB DARIO L.;MEDEIROS DAVID R.;SANDERS DANIEL P.;PFEIFFER DIRK;VYKLICKY LIBOR |
分类号 |
G03F7/004;G03F7/075 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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