| 摘要 |
<p>Disclosed is a display device which comprises a photo detection element (D1) which is arranged in a pixel region (1), an opening (a through-hole) (19a) which is formed in an insulating film (19) that is placed above the photo detection element (D1), and a transparent electrode (20) which is formed in the opening (19a), wherein leakage failure rarely occurs between the transparent electrode (20) and other wiring line (SL). Specifically disclosed is a display device comprising an active matrix substrate (100) in which a first wiring line (SL) and a second wiring line (GL) are formed in a matrix shape, and a photo detection element (D1) which is arranged in a pixel region (1) in the active matrix substrate (100). The display device comprises a first insulating film (17) which is formed between the first wiring line (SL) and the second wiring line (GL), a second insulating film (19) which is formed on an upper layer of the first insulating film (17), and a transparent electrode (20) which is so formed as to enter a through-hole (19a) that is formed in the second insulating film (19) and above the photo detection element (D1). The first wiring line (SL) has a discontinuous section at a part adjacent to the photo detection element, and both ends of the discontinuous section are electrically connected to each other through a support wiring line (16) which is arranged in the same layer in which the second wiring line (GL) is arranged.</p> |
