发明名称 |
PHOTOACID GENERATOR, METHOD FOR MANUFACTURING THE SAME AND RESIST COMPOSITION COMPRISING THE SAME |
摘要 |
PURPOSE: A photoacid generator is provided to improve a line width roughness with the slow diffusion rate of acid generated at exposure, and control the elution of solvent. CONSTITUTION: A photoacid generator is in the chemical formula 1. In the chemical formula1, Y is selected from the group consisting of C3-30 cycloalkyl group and C3-30 cycloalkenyl. Q1 and Q2 is halogen atom, respectively, independently from one another. X is selected from the group consisting of alkanediyl, alkanediyl, NR', S, O, CO and combination thereof. R is selected from the group consisting of hydrogen and alkyl group. n is the integer of 0-5. A+ is a counter ion.
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申请公布号 |
KR20110132207(A) |
申请公布日期 |
2011.12.07 |
申请号 |
KR20110006934 |
申请日期 |
2011.01.24 |
申请人 |
KOREA KUMHO PETROCHEMICAL CO., LTD. |
发明人 |
HAN, JOON HEE;KIM, JIN HO;CHO, SEUNG DUK;SHIN, DAE HYEON |
分类号 |
C07C309/12;C07C309/15;C07C309/19;G03F7/004 |
主分类号 |
C07C309/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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