| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and apparatus for producing ultrapure water for immersion exposure which can minimize operation stop due to exchange of an expendable part and miniaturize the apparatus configuration. <P>SOLUTION: In order to produce ultrapure water for immersion exposure which is supplied to an exposure light passing space between the lowermost surface and a resist of a projection optical system in the immersion exposure apparatus, a plurality of ultraviolet irradiation devices are disposed in series along a passage, an ion exchanger is disposed on the downstream side of the ultraviolet irradiation devices, primary ultrapure water having TOC of 10 ppb or less is supplied, and one of the ultraviolet irradiation devices is used for continuously producing the ultrapure water for immersion exposure and the performance of the active ultraviolet irradiation device is monitored. When the performance of the active ultraviolet irradiation device becomes a predetermined level or less, switching to another ultraviolet irradiation device is performed to continue the continuous operation. <P>COPYRIGHT: (C)2012,JPO&INPIT |
