发明名称 THINNER COMPOSITION FOR REMOVING PHOTOSENSITIVE RESIN AND ANTI-REFLECTIVE COATING
摘要 PURPOSE: A thinner composition for removing a photosensitive resin and a reflection barrier layer is provided to apply the composition to the edge and the rear side of a substrate for removing a photosensitive film. CONSTITUTION: A thinner composition for removing a photosensitive resin and a reflection barrier layer contains the following: one component selected from glycols or their compound; and more than two compounds selected from the group consisting of propylene glycol alkyl ether acetate, propylene glycol alkyl ether, and alkylalkoxy propionate. The glycols are selected from the group consisting of ethylene glycol, propylene glycol, diethylene glycol, triethyleneglycol, tetraethylene glycol, butylene glycol, hexylene glycol, glycerine, 1,3-propanediol, 1,4-butanediol, 1,6-hexanedio, polyethylene glycol, and polypropylene glycol.
申请公布号 KR20110128604(A) 申请公布日期 2011.11.30
申请号 KR20100048135 申请日期 2010.05.24
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 OH, YOUNG NAM;LEE, KYOUNG HO;KIM, SEUNG ON
分类号 G03F7/42 主分类号 G03F7/42
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