摘要 |
PURPOSE: A thinner composition for removing a photosensitive resin and a reflection barrier layer is provided to apply the composition to the edge and the rear side of a substrate for removing a photosensitive film. CONSTITUTION: A thinner composition for removing a photosensitive resin and a reflection barrier layer contains the following: one component selected from glycols or their compound; and more than two compounds selected from the group consisting of propylene glycol alkyl ether acetate, propylene glycol alkyl ether, and alkylalkoxy propionate. The glycols are selected from the group consisting of ethylene glycol, propylene glycol, diethylene glycol, triethyleneglycol, tetraethylene glycol, butylene glycol, hexylene glycol, glycerine, 1,3-propanediol, 1,4-butanediol, 1,6-hexanedio, polyethylene glycol, and polypropylene glycol.
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