发明名称 COMPOUND SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING COMPOUND SEMICONDUCTOR DEVICE
摘要 A compound semiconductor device includes: an Au alloy electrode, an interlayer insulating film, a metal interconnection, and an oxide film. The Au alloy electrode is formed on a compound semiconductor. The interlayer insulating film is formed on the Au alloy electrode. The metal interconnection is connected to the Au alloy electrode via a contact hole formed in the interlayer insulating film. The oxide film is formed at an interface between the Au alloy electrode and the interlayer insulating film, dominating component of the oxide film is a constituent element of the compound semiconductor.
申请公布号 US2011284917(A1) 申请公布日期 2011.11.24
申请号 US20100901731 申请日期 2010.10.11
申请人 MURATA MICHIAKI;USAMI HIROYUKI;OOTA YASUHISA;TAKAHASHI HITOSHI;FUJI XEROX CO., LTD. 发明人 MURATA MICHIAKI;USAMI HIROYUKI;OOTA YASUHISA;TAKAHASHI HITOSHI
分类号 H01L33/40 主分类号 H01L33/40
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