Flatness Adjustable Susceptor and Atomic Layer deposition Apparatus having the Same,申请号KR20090016861U-传众专利搜索

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发明名称	Flatness Adjustable Susceptor and Atomic Layer deposition Apparatus having the Same
摘要
申请公布号	KR200456908(Y1)	申请公布日期	2011.11.24
申请号	KR20090016861U	申请日期	2009.12.28
申请人		发明人
分类号	H01L21/20;H01L21/68	主分类号	H01L21/20
代理机构		代理人
主权项
地址

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