发明名称 COMPOSITION FOR FORMATION OF OVERLAY FILM FOR IMMERSION EXPOSURE AND METHOD FOR FORMATION OF PHOTO-RESIST PATTERN
摘要 <p>A composition for the formation of an overlay film for immersion exposure, which comprises both a polymer [A] having structural units (I) represented by formula (1) and a solvent [S]. In formula (1), R1 is a hydrogen atom, methyl, or trifluoromethyl. It is preferable that the polymer [A] further has sulfo-containing structural units (II). It is preferable that the polymer [A] further has structural units (III) represented by formula (3). In formula (3), R2 is a hydrogen atom, methyl, or trifluoromethyl; and R3 is a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms, or a monovalent alicyclic group having 3 to 20 carbon atoms, with the proviso that in the hydrocarbon group and the alicyclic group, at least one hydrogen atom is replaced by a fluorine atom.</p>
申请公布号 WO2011145663(A1) 申请公布日期 2011.11.24
申请号 WO2011JP61459 申请日期 2011.05.18
申请人 JSR CORPORATION;HAYAMA TAKAHIRO;KUSABIRAKI KAZUNORI;NISHIMURA YUKIO;MARUYAMA KEN;TANAKA KIYOSHI 发明人 HAYAMA TAKAHIRO;KUSABIRAKI KAZUNORI;NISHIMURA YUKIO;MARUYAMA KEN;TANAKA KIYOSHI
分类号 G03F7/11;C08F20/26;G03F7/38;H01L21/027 主分类号 G03F7/11
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