| 摘要 |
PURPOSE: A photo-mask for manufacturing a color filter is provided to form a plurality of nano holes of constant diameters and pitches on the light shielding layer of a mask pattern and to improve the aperture of pixels. CONSTITUTION: A photo-mask for manufacturing a color filter includes at least two mask pattern regions(a to f) corresponding to the color filter region of a transparent substrate. A plurality of nano holes of constant diameters and pitches is formed on the light shielding layer of a mask pattern. The nano holes are formed into first regions(H1) and second regions(H2). The first regions expose the transparent substrate. The second regions expose a phase shift film pattern(31). The light shielding layer is composed of a stacked structure. The stacked structure includes the phase shift film pattern and a light shielding pattern(21). |
