| 摘要 |
PURPOSE: An optical system, a check system, and a manufacturing method are provided to support entire field or entire surface imaging about limited and short working distances. CONSTITUTION: A check system(20) executes the inspection of the surface(22) of an objects(24) before a lithographic process. The check system comprises an illumination source(26), an optical system(28), and a detector(30). The illumination source provides an illumination beam for irradiating the surface of the object. The optical system projects an image of the surface of object on a detector. The detector comprises a sensor(32) and an analyzer(34) which analyzes image data. The detector accepts the image and detects a pattern of the surface of object or the pollution of the surface of object. |
