| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an intermediate used in order to manufacture a monomer for a photoresist resin with high yield. <P>SOLUTION: The compound is shown by Formula (I). In the formula, R<SP POS="POST">1</SP>denote a hydrogen atom or a methyl group. L<SP POS="POST">1</SP>denotes<SP POS="POST">*1</SP>-CO-X<SP POS="POST">1</SP>-A<SP POS="POST">1</SP>-<SP POS="POST">*2</SP>,<SP POS="POST">*1</SP>-CO-X<SP POS="POST">2</SP>-A<SP POS="POST">2</SP>-CO-X<SP POS="POST">3</SP>-A<SP POS="POST">3</SP>-<SP POS="POST">*2</SP>or a phenylene group. X<SP POS="POST">1</SP>, X<SP POS="POST">2</SP>and X<SP POS="POST">3</SP>each independently denote -O- or -N(R<SP POS="POST">3</SP>)-, and R<SP POS="POST">3</SP>denotes a hydrogen atom or a 1-6C alkyl group. A<SP POS="POST">1</SP>, A<SP POS="POST">2</SP>and A<SP POS="POST">3</SP>each independently denote a 1-4C alkylene group, a divalent 6-12C saturated ring-like hydrocarbon group or a phenylene group. *1 denotes a bond with -C(R<SP POS="POST">1</SP>)=CH<SB POS="POST">2</SB>, and *2 denotes a bond with -CO-. <P>COPYRIGHT: (C)2012,JPO&INPIT |
