APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

摘要

PURPOSE: A substrate processing apparatus and a substrate processing method are provided to improve the deposit efficiency of a substrate by creating a pressure gradient within a chamber and prevent reacting gas which is exhausted by an exhaust pipe to back up to the chamber. CONSTITUTION: A chamber comprises an internal reaction space. An exhaust device comprises an exhaust pipe(162) and an exhaust pump. An exhaust control part controls gas exhaust volume by being connected to the exhaust pipe. The exhaust control part comprises housing(11) and a sliding-gate(33). The sliding-gate is formed into a plurality of plates. The plates include a connecting hole which is formed in top and bottom directions.