| 发明名称 |
Restoring low dielectric constant film properties |
| 摘要 |
A method for restoring the dielectric constant of a low dielectric constant film is described. A porous dielectric layer having a plurality of pores is formed on a substrate. The plurality of pores is then filled with an additive to provide a plugged porous dielectric layer. Finally, the additive is removed from the plurality of pores. |
| 申请公布号 |
US8058183(B2) |
申请公布日期 |
2011.11.15 |
| 申请号 |
US20090481382 |
申请日期 |
2009.06.09 |
| 申请人 |
CUI ZHENJIANG;YU MAY;DEMOS ALEXANDROS T.;NAIK MEHUL;APPLIED MATERIALS, INC. |
发明人 |
CUI ZHENJIANG;YU MAY;DEMOS ALEXANDROS T.;NAIK MEHUL |
| 分类号 |
H01L21/31;H01L21/20;H01L21/36;H01L21/469 |
主分类号 |
H01L21/31 |
| 代理机构 |
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