发明名称 SPUTTERING TARGET
摘要 <P>PROBLEM TO BE SOLVED: To provide a sputtering target capable of suppressing the occurrence of arcing while achieving an increase in thickness. <P>SOLUTION: An inclined plane 14 is formed in a target material 10, which gradually makes the diameter of the target material 10 smaller or its width smaller from the middle of the side face 13 of the target material toward the rear surface 12. The target material 10 is formed so that plots in the Ra-h plane representing the combination of surface roughness of a ridgeline part 15 forming a boundary of the side face 13 and the inclined plane 14, and a height h based on the rear surface 12 are included in the first range S1 or the second range S2 which is part of the first range S1. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011225981(A) 申请公布日期 2011.11.10
申请号 JP20110068238 申请日期 2011.03.25
申请人 TAIHEIYO CEMENT CORP;NIHON CERATEC CO LTD 发明人 ISHIDA HIRONORI;MIYATA NOBORU;IGUCHI MASAHITO;SHIMOJIMA HIROMASA;ICHIKAWA YOSHITAKA
分类号 C23C14/34 主分类号 C23C14/34
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