发明名称 METHOD AND DEVICE FOR INSPECTING SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To eliminate influences of disturbance light noise intruding into a detection optical system from a peripheral environment of a transparent substrate with a large thickness upon inspecting a defect in the substrate, and improve detection accuracy of defects. <P>SOLUTION: A beam containing a large quantity of a first polarized light component is used as a beam to irradiate a substrate surface. In front of each light-receiving means, polarizing means that only transits the first polarized light component, and bandpass filter means only transmitting light near a frequency component of the beam are disposed. As the irradiation beam contains a large quantity of the first polarized light component, scattering light scattering on a top face, inside or back face of the substrate also includes a large quantity of the first polarized component. Only the scattering light containing a large quantity of the first polarized light component passes through the polarizing means and the bandpass filter means and is received by the light-receiving means. Thereby, the influences of the disturbance light noise intruding into the detection optical system from the peripheral environment of the substrate can be reduced as much possible and the detection accuracy of defects can be improved. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011226939(A) 申请公布日期 2011.11.10
申请号 JP20100097532 申请日期 2010.04.21
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SHIMODA YUICHI
分类号 G01N21/958 主分类号 G01N21/958
代理机构 代理人
主权项
地址