| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a development processing method and development processing apparatus for uniformizing development processing, reducing a pattern collapse by developing solution or generation of a development loading effect, and capable of acquiring a high-quality substrate without variations in size in the surface to be processed. <P>SOLUTION: In a development processing method for an exposure-treated photomask substrate 1, the substrate is tilted at an angle of over 0° and less than 90° to a horizontal plane, the tilting direction of the substrate during the development of the same being successively controlled to vary by 360° in a rotational direction of vertical axis passing through the center of the substrate 1 during the development of the substrate. A nozzle device 5 formed by disposing multiple nozzles 7 on a flat plate-shaped nozzle holder 6 is used and the developing solution is fed from each nozzle 7 of the nozzle device 5 to form a developing solution paddle on the substrate and at the same time, the amount of the developing solution fed from the nozzle 7 is individually controlled. <P>COPYRIGHT: (C)2012,JPO&INPIT |
